CHiPPS is pursuing its holistic approach to patterning science by studying the fundamentals of the relevant interactions of light and matter and by recognizing the interdependence of every physical and chemical event at all levels of the patterning process from radiation exposure through pattern transfer.
Holistic Understanding
Holistic understanding of the radiation-driven reaction pathways triggered by EUV photoionization
Controlled Synthesis
Controlled synthesis of multifunctional radiation sensitive materials, bypassing stochastic and speed limitations of current polymer and metal–organic systems
Hierarchical Materials
New hierarchical materials with relevant function and structure to augment EUV resists, thereby circumventing stochastic limits, while maintaining high level pattern complexity
Co-design Framework
Co-design framework for integrated patterning capturing the underlayer, photo-sensitive layer, top layer, solvation material/process, healing layer, and pattern transfer
Design rules for resist architectures to control reaction fronts and stochastic variation in chemical patterning at sub-nm length scales
Bottom-up functional hierarchical materials and selective-area pattern transfer for mitigation of stochastics
Quantitative theory/modeling for rational design of patterning materials
Multimodal characterization of patterning materials and operando processes to inform theory and improve co-design
Systematically addressing six fundamental questions will provide a scientific footing for the rational design of patterning material systems and a foundation for revolutionary advances in our ability to control patterning at the level of atoms and molecules.
