- Dr Qi Zhang: Characterization of latent image of resist via critical-dimension resonant soft X-ray scattering
- Dr Bernhard Luttgenau: High precision monitoring of outgassing species in model EUV photoresists with a cavity ring-down spectrometer
- Dr Kas Andrle: Using a FEM based Maxwell solver and RSoXS measurement for the analysis of photoresist pattern
- Dr Oleg Kostko: Impact of electron exposure on model photoresist thin films
- Dr Honggu Im: Understanding the role of underlayers in enhancing EUV resist sensitivity
- Dr Beihang Yu: Sequence-defined polypeptoid brushes as growth-promoters in vapor phase infiltration for area-selective deposition of metal oxides
- Cameron Adams: Polymer sequence alters sensitivity and resolution in chemically-amplified polypeptoid photoresists
- Chenyun Yuan: Sequence-defined polypeptoids facilitating stochastics control and discovery of new EUV patterning mechanism
- Collaborator Padraic O’Reilly: Hybrid chemical characterization of latent images in EUV resist with 12nm half-pitch features
