Bruno La Fontaine is a senior scientist at Berkeley Lab and the Director of the Center for X-Ray Optics.

During his career, which spans over 30 years, he has been involved in pioneering technology development work on Extreme Ultraviolet (or EUV) lithography, as well as research in a number of areas related to the application of high-power lasers. After receiving his Ph.D. in plasma physics from INRS near Montréal, in Canada, he started his career as a post-doc at Bell Labs, then as a research scientist at Lawrence Livermore Lab, before accepting a position as Professor of physics at INRS. In 2000, he returned to the US to join the semiconductor industry, first at Advanced Micro Devices (AMD), where he was a fellow,  before moving to Cymer and then ASML. Bruno is a fellow of SPIE and is an inventor of inventor of over 40 US and international patents, as well as being an author of over 130 papers.